Achieving sub-0.5-angstrom–resolution ptychography in an uncorrected electron microscope

Author:

Nguyen Kayla X.1ORCID,Jiang Yi2ORCID,Lee Chia-Hao1ORCID,Kharel Priti3ORCID,Zhang Yue4ORCID,van der Zande Arend M.145ORCID,Huang Pinshane Y.15ORCID

Affiliation:

1. Department of Materials Science and Engineering, University of Illinois Urbana–Champaign, Urbana, IL, USA.

2. Advanced Photon Source Facility, Argonne National Laboratory, Lemont, IL, USA.

3. Department of Chemistry, University of Illinois Urbana–Champaign, Urbana, IL, USA.

4. Department of Mechanical Science and Engineering, University of Illinois Urbana–Champaign, Urbana, IL, USA.

5. Materials Research Laboratory, University of Illinois Urbana–Champaign, Urbana, IL, USA.

Abstract

Subangstrom resolution has long been limited to aberration-corrected electron microscopy, where it is a powerful tool for understanding the atomic structure and properties of matter. Here, we demonstrate electron ptychography in an uncorrected scanning transmission electron microscope (STEM) with deep subangstrom spatial resolution down to 0.44 angstroms, exceeding the conventional resolution of aberration-corrected tools and rivaling their highest ptychographic resolutions​. Our approach, which we demonstrate on twisted two-dimensional materials in a widely available commercial microscope, far surpasses prior ptychographic resolutions (1 to 5 angstroms) of uncorrected STEMs. We further show how geometric aberrations can create optimized, structured beams for dose-efficient electron ptychography. Our results demonstrate that expensive aberration correctors are no longer required for deep subangstrom resolution.

Publisher

American Association for the Advancement of Science (AAAS)

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