Polarization-Induced Hole Doping in Wide–Band-Gap Uniaxial Semiconductor Heterostructures

Author:

Simon John1,Protasenko Vladimir1,Lian Chuanxin1,Xing Huili1,Jena Debdeep1

Affiliation:

1. Department of Electrical Engineering, University of Notre Dame, 275 Fitzpatrick Hall, Notre Dame, IN 46556, USA.

Abstract

Activating Stubborn Dopants Many applications of semiconductor light-emitting diodes and lasers, such as reading optical disks, benefit from shorter wavelengths, but this requires materials with larger energy gaps between their valance and conduction bands. The electronic conductivity of these materials often has to be increased by doping with impurity atoms. However, in nitride materials, such as GaN and AlGaN, hole doping with acceptor atoms such as Mg is ineffective at room temperature. Simon et al. (p. 60 ) grew a gradient of AlGaN on the surface of GaN and found that the polarization of the layer could field-ionize the acceptor dopants efficiently at room temperature. The heterostructure was used successfully in a light-emitting diode that emits in the ultraviolet.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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