Ultrahigh-Density Nanowire Lattices and Circuits

Author:

Melosh Nicholas A.12,Boukai Akram12,Diana Frederic3,Gerardot Brian3,Badolato Antonio3,Petroff Pierre M.3,Heath James R.12

Affiliation:

1. California Nanosystems Institute, University of California, Box 956905, Los Angeles, CA 90095, USA.

2. California Institute of Technology, Pasadena, CA 91125, USA.

3. California Nanosystems Institute, University of California, Santa Barbara, CA 93106, USA.

Abstract

We describe a general method for producing ultrahigh-density arrays of aligned metal and semiconductor nanowires and nanowire circuits. The technique is based on translating thin film growth thickness control into planar wire arrays. Nanowires were fabricated with diameters and pitches (center-to-center distances) as small as 8 nanometers and 16 nanometers, respectively. The nanowires have high aspect ratios (up to 10 6 ), and the process can be carried out multiple times to produce simple circuits of crossed nanowires with a nanowire junction density in excess of 10 11 per square centimeter. The nanowires can also be used in nanomechanical devices; a high-frequency nanomechanical resonator is demonstrated.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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4. We have reproduced this technique on more than a dozen commercially purchased and grown-in-house superlattices and we have found that there is appreciable chemical variability from wafer to wafer with a corresponding variability in etch chemistry.

5. Currently the superlattice is not being reused because of the small amount necessary for each imprint. However polishing of GaAs/AlGaAs superlattices is well established for laser devices and may be useful here.

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