1. The theory and design of plate glass polishing machines;Preston F;J Glass Technol,1927
2. Kernel TIF method for effective material removal control in rotating pitch tool-based optical figuring;Yi H-S;Int J Adv Manuf Technol,2011
3. Process parameter effects on material removal in magnetorheological finishing of borosilicate glass;Miao C;Appl Opt,2010
4. Mechanical model of nanoparticles for material removal in chemical mechanical polishing process;Chen H;Friction,2016
5. Wang C, Sherman P, Chandra A (2005) A Stochastic Model for the Effects of Pad Surface Topography Evolution on Material Removal Rate Decay in Chemical–Mechanical Planarization. IEEE Transactions on Semiconductor Manufacturing