Intensity Difference Map (IDM) Accuracy Analysis for OPC Efficiency Verification and Further Enhancement-Reference-Cited by-同舟云学术

Intensity Difference Map (IDM) Accuracy Analysis for OPC Efficiency Verification and Further Enhancement

Published:2017 Issue:0 Volume:10 Page:28-38
ISSN:1882-6687
Container-title:IPSJ Transactions on System LSI Design Methodology
language:en
Short-container-title:IPSJ Transactions on System LSI Design Methodology

Author:

Awad Ahmed¹,Takahashi Atsushi¹,Tanaka Satoshi²,Kodama Chikaaki²

Affiliation:

1. Department of Communications and Computer Engineering, Graduate School of Science and Engineering, Tokyo Institute of Technology

2. Toshiba Corporation Storage & Electronic Devices Solutions Company

Publisher

Information Processing Society of Japan

Subject

Electrical and Electronic Engineering,Computer Science Applications

Link

https://www.jstage.jst.go.jp/article/ipsjtsldm/10/0/10_28/_pdf

Reference28 articles.

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2. [2] Fabian Pease, R. and Chou, S.: Lithography and Other Patterning Techniques for Future Electronics, Proc. IEEE, pp.248-270 (2008).

3. [3] Granik, Y. and Cobb, N.: Matrix Optical Process Correction, US Patent US6928634 B2 (2003).

4. [4] Gu, A. and Zakhor, A.: Optical Proximity Correction With Linear Regression, IEEE Trans. Semiconductor Manufacturing, pp.263-271 (2008).

5. [5] Mukhejree, M., Buamm, Z., Lavin, M., Samuels, D. and Singh, R.: Method for Adaptive Segment Refinement Optical Proximity Correction, US Patent 7043712 (2006).

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