Superlens-enhanced laser interference lithography-Reference-Cited by-同舟云学术

Superlens-enhanced laser interference lithography

Published:2018-11-14 Issue:12 Volume:11 Page:125201
ISSN:1882-0778
Container-title:Applied Physics Express
language:
Short-container-title:Appl. Phys. Express

Author:

Guo Xudong,Li Li,Hu Yaowei,Cao Liang,Dong Litong,Wang Lu,Ding Ran,Weng Zhankun,Song Zhengxun,Xu Hongmei,Yang Zhen,Liu Xianping,Tian Yanling,Wang Zuobin

Publisher

IOP Publishing

Subject

General Physics and Astronomy,General Engineering

Link

http://stacks.iop.org/1882-0786/11/i=12/a=125201/pdf

Reference41 articles.

1. Sub-10 nm Nanopattern Architecture for 2D Material Field-Effect Transistors

2. Nanofabrication by electron beam lithography and its applications: A review

3. Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning

4. Recent Advances in Cantilever-Free Scanning Probe Lithography: High-Throughput, Space-Confined Synthesis of Nanostructures and Beyond

5. Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size

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