In situ X-ray photoelectron spectroscopy study of gas cluster ion beam etching of FeCo film
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference30 articles.
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1. Surface preparation of metal films by gas cluster ion beams using organic acid vapor for Cu–Cu bonding;Japanese Journal of Applied Physics;2022-03-24
2. Atomic layer etching by gas cluster ion beams with acetylacetone;Japanese Journal of Applied Physics;2019-05-30
3. Irradiation conditions of gas cluster ion beam for surface-activated bonding;Japanese Journal of Applied Physics;2017-12-07
4. Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions?;Japanese Journal of Applied Physics;2017-06-01
5. Atomic layer etching of Cu film using gas cluster ion beam;Journal of Physics D: Applied Physics;2017-04-03
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