Computational simulations and parametric studies for directed self-assembly process development and solution of the inverse directed self-assembly problem-Reference-Cited by-同舟云学术

Computational simulations and parametric studies for directed self-assembly process development and solution of the inverse directed self-assembly problem

Published:2014-05-23 Issue:6S Volume:53 Page:06JC01
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Latypov Azat,Garner Grant,Preil Moshe,Schmid Gerard,Wang Wei-Long,Xu Ji,Zou Yi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/53/i=6S/a=06JC01/pdf

Reference31 articles.

1. Directed block copolymer self-assembly for nanoelectronics fabrication

2. Monte Carlo Simulations of a Coarse Grain Model for Block Copolymers and Nanocomposites

3. Interpolation in the Directed Assembly of Block Copolymers on Nanopatterned Substrates: Simulation and Experiments

4. Scalable simulations for directed self-assembly patterning with the use of GPU parallel computing

5. Theoretically informed coarse grain simulations of polymeric systems

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Globally Convergent Modified Newton Method for the Direct Minimization of the Ohta--Kawasaki Energy with Application to the Directed Self-Assembly of Diblock Copolymers;SIAM Journal on Scientific Computing;2022-01-11

2. Level-set strategy for inverse DSA-lithography;Journal of Computational Physics;2018-12

3. Redundant Via Insertion for DSAL;Physical Design and Mask Synthesis for Directed Self-Assembly Lithography;2018

4. Post-Placement Optimization for MP-DSAL Compliant Layout;Physical Design and Mask Synthesis for Directed Self-Assembly Lithography;2018

5. Placement Optimization for DSAL;Physical Design and Mask Synthesis for Directed Self-Assembly Lithography;2018