Formation of amorphous silicon passivation films with high stability against postannealing, air exposure, and light soaking using liquid silicon-Reference-Cited by-同舟云学术

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Formation of amorphous silicon passivation films with high stability against postannealing, air exposure, and light soaking using liquid silicon

Published:2016-03-22 Issue:4S Volume:55 Page:04ES12
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Guo Cheng,Ohdaira Keisuke,Takagishi Hideyuki,Masuda Takashi,Shen Zhongrong,Shimoda Tatsuya

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/55/i=4S/a=04ES12/pdf

Reference32 articles.

1. Silicon Heterojunction Solar Cells: Towards Low-cost High-Efficiency Industrial Devices and Application to Low-concentration PV

2. 24.7% Record Efficiency HIT Solar Cell on Thin Silicon Wafer

3. High-efficiency Silicon Heterojunction Solar Cells: A Review

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Approaching Solar-Grade a-Si:H for Photovoltaic Applications via Atmospheric Pressure CVD Using a Trisilane-Derived Liquid Precursor;Solar RRL;2017-06-23

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