Development of open air silicon deposition technology by silane-free atmospheric pressure plasma enhanced chemical transport under local ambient gas control
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/55/i=7S2/a=07LE06/pdf
Reference38 articles.
1. Open air deposition of SiO2film from a cold plasma torch of tetramethoxysilane‐H2‐Ar system
2. Synthesis of Diamond-Like Carbon Films by Nanopulse Plasma Chemical Vapor Deposition in Open Air
3. Open-air laser-induced chemical vapor deposition of silicon carbide coatings
4. Study of plasma enhanced chemical vapor deposition of ZnO films by non-thermal plasma jet at atmospheric pressure
5. Solution-processed silicon films and transistors
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