SiN etching characteristics of Ar/CH3F/O2plasma and dependence on SiN film density
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/55/i=8/a=086502/pdf
Reference55 articles.
1. Ion and neutral transportation consideration in etching of thin Si[sub 3]N[sub 4] in high aspect ratio structures for aspect ratio independent etching
2. Highly selective etching of silicon nitride to physical-vapor-deposited a-C mask in dual-frequency capacitively coupled CH2F2∕H2 plasmas
3. Ultrahigh selective etching of Si3N4 films over SiO2 films for silicon nitride gate spacer etching
4. Infinitely high etch selectivity during CH2F2/H2 dual-frequency capacitively coupled plasma etching of silicon nitride to chemical vapor-deposited a-C
5. Silicon nitride hardmask fabrication using a cyclic CHF3-based reactive ion etching process for vertical profile nanostructures
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Etching Mechanism Based on Hydrogen Fluoride Interactions with Hydrogenated SiN Films Using HF/H2 and CF4/H2 Plasmas;ACS Applied Electronic Materials;2023-12-12
2. Highly selective Si3N4 etching on Si using pulsed-microwave CH3F/O2/Ar plasma;Japanese Journal of Applied Physics;2023-07-21
3. Atomic layer etching of silicon nitride film by oxygen gas cluster ion beam with acetylacetone;Japanese Journal of Applied Physics;2023-06-01
4. Vertical sidewall of silicon nitride mask and smooth surface of etched-silicon simultaneously obtained using CHF3/O2 inductively coupled plasma;Vacuum;2023-01
5. Synthesis of CuSiO3-loaded P-doped porous biochar derived from phytic acid-activated lemon peel for enhanced adsorption of NH3;Separation and Purification Technology;2022-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3