Wet Etching of Amorphous TiO2Thin Films Using H3PO4–H2O2Aqueous Solution-Reference-Cited by-同舟云学术

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Wet Etching of Amorphous TiO2Thin Films Using H3PO4–H2O2Aqueous Solution

Published:2013-09-01 Issue:9R Volume:52 Page:098002
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Okazaki Sohei,Ohhashi Takuya,Nakao Shoichiro,Hirose Yasushi,Hitosugi Taro,Hasegawa Tetsuya

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference16 articles.

1. Transparent Conducting Oxides

2. Past achievements and future challenges in the development of optically transparent electrodes

3. A Modified Transparent Conducting Oxide for Flat Panel Displays Only

4. ZnO Etch-Feature Control via Concentration and Temperature of Various Acids

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1. A facile synthesis of a novel Ti4O7 anode rich in oxygen defects and its electrochemical oxidation of florfenicol: Performance and mechanism;Separation and Purification Technology;2023-04

2. Effects of adventitious impurity adsorption on oxygen interstitial injection rates from submerged TiO2(110) and ZnO(0001) surfaces;Journal of Vacuum Science & Technology A;2023-03-21

3. Corrosion resistance of a superelastic NiTi alloy coated with graphene–based coatings;Progress in Organic Coatings;2022-04

4. Development of a Lightweight LTO/Cu Electrode as a Flexible Anode via Etching Process for Lithium-Ion Batteries;ACS Omega;2022-03-17

5. Chemical and photoelectrochemical instability of amorphous TiO2 layers quantified by spectroscopic ellipsometry;Journal of Materials Chemistry A;2020

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