Characterization of Porous Structures in Advanced Low-kFilms with Thin TaN Layers Using Monoenergetic Positron Beams-Reference-Cited by-同舟云学术

Characterization of Porous Structures in Advanced Low-kFilms with Thin TaN Layers Using Monoenergetic Positron Beams

Published:2013-10-01 Issue:10R Volume:52 Page:106501
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Uedono Akira,Verdonck Patrick,Delabie Annelies,Swerts Johan,Witters Thomas,Conard Thierry,Baklanov Mikhail R.,Elshocht Sven Van,Oshima Nagayasu,Suzuki Ryoichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference28 articles.

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3. Evaluation of a New Advanced Low-kMaterial

4. Low Dielectric Constant Materials

5. Influence of the UV Cure on Advanced Plasma Enhanced Chemical Vapour Deposition Low-kMaterials

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