Improved Nanogap Servo System Using an Error-Based Disturbance Observer for High-Speed in Solid Immersion Lens-Based Plasmonic Lithography-Reference-Cited by-同舟云学术

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Improved Nanogap Servo System Using an Error-Based Disturbance Observer for High-Speed in Solid Immersion Lens-Based Plasmonic Lithography

Published:2013-09-01 Issue:9S2 Volume:52 Page:09LG02
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Lim Geon,Kim Taeseob,Lee Won-Sup,Choi Guk-Jong,Park Kyoung-Su,Park Young-Pil,Yang Hyunseok,Park No-Cheol

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference35 articles.

1. Ultrahigh light transmission through a C-shaped nanoaperture

2. Finitte-Difference Time-Domain Studies on Optical Transmission through Planar Nano-Apertures in a Metal Film

3. Surface Plasmon Interference Nanolithography

4. Enhanced optical near field from a bowtie aperture

5. Effects of dielectric substrate properties for optical phenomena in a nanoscale ridge aperture

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control;Applied Physics Letters;2015-02-02

2. Track error detection system with waveform comparison method for super-resolution optical read-only-memory disc;IEEE Transactions on Consumer Electronics;2014-08

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