Surface Transitions During InGaN Growth on GaN(0001) in Metal–Organic Vapor Phase Epitaxy
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference12 articles.
1. Surface Structure of GaN(0001) in the Chemical Vapor Deposition Environment
2. Surface termination during GaN growth by metalorganic vapor phase epitaxy determined by ellipsometry
3. Reconstructions of GaN(0001) and (0001̄) surfaces: Ga-rich metallic structures
4. GaN/AlN short-period superlattices for intersubband optoelectronics: A systematic study of their epitaxial growth, design, and performance
5. Indium adlayer kinetics on the gallium nitride (0001) surface: Monitoring indium segregation and precursor-mediated adsorption
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1. Understanding indium incorporation of InGaN grown on polar, semi-polar, and non-polar orientation by metal–organic vapor phase epitaxy;Applied Physics Letters;2022-08-22
2. Mechanism leading to semi-insulating property of carbon-doped GaN: Analysis of donor acceptor ratio and method for its determination;Journal of Applied Physics;2021-11-14
3. Morphological study of InGaN on GaN substrate by supersaturation;Journal of Crystal Growth;2019-02
4. Surface reconstructions of (0001) AlN during metal-organic vapor phase epitaxy;physica status solidi (b);2017-06-14
5. Indium incorporation into InGaN: The role of the adlayer;Journal of Crystal Growth;2017-04
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