Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer-Reference-Cited by-同舟云学术

Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer

Published:2013-05-01 Issue:5R Volume:52 Page:056701
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Watanabe Takeo,Kikuchi Yukiko,Takahashi Toshiya,Katayama Kazuhiro,Takagi Isamu,Sugie Norihiko,Tanaka Hiroyuki,Shiobara Eishi,Inoue Soichi,Harada Tetsuo,Kinoshita Hiroo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference25 articles.

1. Soft x-ray reduction lithography using multilayer mirrors

2. Investigation of carbon contamination of mirror surfaces exposed to synchrotron radiation

3. EUV mask cleaning by dry and wet processes

4. Investigation of Contamination Removal from Finished EUVL Mask

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