Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern Using Tone Reversal Process-Reference-Cited by-同舟云学术

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Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern Using Tone Reversal Process

Published:2013-10-01 Issue:10R Volume:52 Page:105201
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ootera Yasuaki,Sugawara Katsuya,Kanamaru Masahiro,Yamamoto Ryousuke,Kawamonzen Yoshiaki,Kihara Naoko,Kamata Yoshiyuki,Kikitsu Akira

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference30 articles.

1. Patterned media: a viable route to 50 Gbit/in/sup 2/ and up for magnetic recording?

2. Patterned Magnetic Recording Media

3. Prospects for bit patterned media for high-density magnetic recording

4. Future Options for HDD Storage

5. Fabrication of Ridge-and-Groove Servo Pattern Consisting of Self-Assembled Dots for 2.5 $\hbox{Tb/in}^{2}$ Bit Patterned Media

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Interaction of Femtosecond Laser with Perovskites for Advanced Photonics;Advanced Photonics Research;2024-05-23

2. Introduction;Physical Design and Mask Synthesis for Directed Self-Assembly Lithography;2018

3. Nanoimprint lithography tone reversal process using poly(methyl methacrylate) and hydrogen silsesquioxane;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-07

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