Nanoimprint lithography tone reversal process using poly(methyl methacrylate) and hydrogen silsesquioxane-Reference-Cited by-同舟云学术

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Nanoimprint lithography tone reversal process using poly(methyl methacrylate) and hydrogen silsesquioxane

Published:2017-07 Issue:4 Volume:35 Page:041603
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Chang Long¹,Litvinov Dmitri²

Affiliation:

1. Department of Electrical and Computer Engineering, Science and Engineering Research Center E1007A, University of Houston, 3605 Cullen Blvd., Houston, Texas 77204

2. Department of Electrical and Computer Engineering, Science and Engineering Research Center E1006, University of Houston, 3605 Cullen Blvd., Houston, Texas 77204

Funder

Cancer Prevention and Research Institute of Texas (CPRIT)

National Science Foundation (NSF)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.4993562

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