Etching Characteristics and Mechanisms of TiO2Thin Films in HBr/Cl2/Ar Inductively Coupled Plasma
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference21 articles.
1. A low-cost, high-efficiency solar cell based on dye-sensitized colloidal TiO2 films
2. Characterization of laser-densified sol-gel films for the fabrication of planar and strip optical waveguides
3. Microstructural effect on the creep strength of a Sn-3.5%Ag solder alloy
4. High-k cobalt–titanium oxide dielectrics formed by oxidation of sputtered Co/Ti or Ti/Co films
5. Inductively coupled plasma etching of amorphous Al[sub 2]O[sub 3] and TiO[sub 2] mask layers grown by atomic layer deposition
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