Stochastic electron energy gain in inductively coupled magnetized plasmas accompanying electron reflection at chamber wall
Author:
Funder
Japan Society for the Promotion of Science
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/57/i=12/a=126101/pdf
Reference42 articles.
1. Very uniform and high aspect ratio anisotropy SiO2 etching process in magnetic neutral loop discharge plasma
2. Application of magnetic neutral loop discharge plasma to SiO2 etching process
3. Magnetic neutral loop discharge (NLD) plasmas for surface processing
4. Structure and dynamics of a magnetic neutral loop discharge plasma described using electron motion in a quadrupole magnetic field
5. Structure and Energy Deposition Process of an Inductively Coupled Plasma Under Confronting Divergent Magnetic Fields
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1. Analysis of electron heating due to partial resonance in an inductively coupled plasma under confronting divergent magnetic fields;Japanese Journal of Applied Physics;2023-04-12
2. Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies;Japanese Journal of Applied Physics;2022-11-30
3. A Measure for the Electron Energy Gain by Partial Resonance around the Resonant Magnetic Field Region in an Inductively Coupled Magnetized Plasma;IEEJ Transactions on Fundamentals and Materials;2022-06-01
4. Stochastic electron energy gain under sheath electric field near sidewall of chamber to drive inductively coupled magnetized plasmas;Japanese Journal of Applied Physics;2020-02-17
5. Phase-resolved profiles of electron energy deposition in inductively coupled radio-frequency plasmas driven under confronting divergent magnetic fields;Japanese Journal of Applied Physics;2019-10-16
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