High-performance InGaAs FinFETs with raised source/drain extensions
Author:
Funder
REMINDER EU Project
INSIGHT H2020
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://iopscience.iop.org/article/10.7567/1347-4065/ab2c97/pdf
Reference30 articles.
1. Nanometre-scale electronics with III–V compound semiconductors
2. III–V compound semiconductor transistors—from planar to nanowire structures
3. High Performance Quantum Well InGaAs-On-Si MOSFETs With sub-20 nm Gate Length For RF Applications
4. Radio-Frequency Characterization of Selectively Regrown InGaAs Lateral Nanowire MOSFETs
5. Defect reduction of GaAs epitaxy on Si (001) using selective aspect ratio trapping
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1. High Performance Inversion-Mode In0.53Ga0.47As FinFETs for Logic and RF Applications;IEEE Transactions on Nanotechnology;2023
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3. III-V-on-Si transistor technologies: Performance boosters and integration;Solid-State Electronics;2021-11
4. Heterogeneous Integration of III–V Materials by Direct Wafer Bonding for High-Performance Electronics and Optoelectronics;IEEE Transactions on Electron Devices;2021-07
5. Performance investigation of a novel GaAs1-xSbx-on-insulator (GASOI) FinFET: Role of interface trap charges and hetero dielectric;Materials Today Communications;2021-03
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