Fabrication and physical properties of bismuth layer-structured ferroelectric thin films with c-axis orientation epitaxially grown by high-temperature sputtering-Reference-Cited by-同舟云学术

Fabrication and physical properties of bismuth layer-structured ferroelectric thin films with c-axis orientation epitaxially grown by high-temperature sputtering

Published:2019-08-23 Issue:SL Volume:58 Page:SLLB09
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Migita Tsubasa,Kobune Masafumi,Ito Ryoga,Obayashi Taiki,Kikuchi Takeyuki,Fujisawa Hironori,Nakashima Seiji^ORCID

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://iopscience.iop.org/article/10.7567/1347-4065/ab388f/pdf

Reference34 articles.

1. Effects of sputtering gas pressure on physical properties of ferroelectric (Bi3.25Nd0.65Eu0.10)Ti3O12nanoplate films

2. Magnetic and structural characteristics of multiferroic Fe3O4/(Bi3.25Nd0.65Eu0.10)Ti3O12composite thin films deposited by metalorganic chemical vapor deposition

3. Structural, Magnetic and Electric Characteristics of Multiferroic CoFe₂O₄/BNEuT Composite Thin Films Produced by Non-aqueous Sol-gel Process

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