Effects of sputtering gas pressure on physical properties of ferroelectric (Bi3.25Nd0.65Eu0.10)Ti3O12nanoplate films-Reference-Cited by-同舟云学术

Effects of sputtering gas pressure on physical properties of ferroelectric (Bi3.25Nd0.65Eu0.10)Ti3O12nanoplate films

Published:2015-08-27 Issue:10S Volume:54 Page:10NA01
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kobune Masafumi,Kuriyama Tomoyuki,Furotani Ryosuke,Kugimiya Takuya,Ueshima Satoshi,Kikuchi Takeyuki,Fujisawa Hironori,Nakashima Seiji,Shimizu Masaru,Fukumuro Naoki

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/54/i=10S/a=10NA01/pdf

Reference32 articles.

1. A Variable-Temperature Powder Neutron Diffraction Study of Ferroelectric Bi4Ti3O12

2. Imprint Characteristics of SrBi2Ta2O9Thin Films with Modified Sr Composition

3. High-Power Piezoelectric Vibration Characteristics of Textured SrBi2Nb2O9Ceramics

4. Large anisotropy of ferroelectric and dielectric properties for Bi3.15Nd0.85Ti3O12 thin films deposited on Pt∕Ti∕SiO2∕Si

5. Crystal structure and polarization phenomena of epitaxially grown Pb(Zr,Ti)O3 thin-film capacitors

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