Author:
Kumakura Sho,Tabata Masahiro,Honda Masanobu
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
11 articles.
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1. Dry Process;Japanese Journal of Applied Physics;2023-05-16
2. Study of Silicon Nitride Etched by Cyclic Atomic Layer Etching;2022 IET International Conference on Engineering Technologies and Applications (IET-ICETA);2022-10-14
3. Dry Process;Japanese Journal of Applied Physics;2022-06-13
4. Importance of higher‐level excited species in argon remote plasma sources: Numerical modeling with consideration of detailed chemical reaction pathways;Plasma Processes and Polymers;2022-03-24
5. New innovative etch technologies utilizing state-of-the-art atomic-level process for advanced patterning;2022 6th IEEE Electron Devices Technology & Manufacturing Conference (EDTM);2022-03-06