Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition

Published:2019-02-13 Issue:3 Volume:58 Page:030912
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Sugiura Hirotsugu^ORCID,Jia Lingyun,Ohashi Yasuyuki,Kondo Hiroki,Ishikawa Kenji,Tsutsumi Takayoshi,Hayashi Toshio,Takeda Keigo,Sekine Makoto,Hori Masaru

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://iopscience.iop.org/article/10.7567/1347-4065/aafd49/pdf

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5. Carbon nitride thin-films deposited from coupled r.f.-magnetron sputtering and ion beam-assisted processes

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