Electron Beam Lithography of 15×15 nm2Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer-Reference-Cited by-同舟云学术

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Electron Beam Lithography of 15×15 nm2Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer

Published:2012-06-01 Issue:6S Volume:51 Page:06FB02
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Komori Takuya,Zhang Hui,Akahane Takashi,Mohamad Zulfakri,Yin You,Hosaka Sumio

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference32 articles.

1. Effect of ion beam patterning on the write and read performance of perpendicular granular recording media

2. Fabrication of Ridge-and-Groove Servo Pattern Consisting of Self-Assembled Dots for 2.5 $\hbox{Tb/in}^{2}$ Bit Patterned Media

3. Fabrication of FePt type exchange coupled composite bit patterned media by block copolymer lithography

4. Nano-dot and -pit arrays with a pitch of 25nm×25nm fabricated by EB drawing, RIE and nano-imprinting for 1Tb/in2 storage

5. Simple high resolution nanoimprint-lithography

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Estimation of HSQ Resist Profile by Using High Contrast Developement Model for High Resolution EB Lithography;Key Engineering Materials;2013-12

2. Electron Beam Lithography for Fabrication of Nanophase-Change Memory;Applied Mechanics and Materials;2013-12

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