Role of mask patterns in fabrication of Si nanotip arrays-Reference-Cited by-同舟云学术

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Role of mask patterns in fabrication of Si nanotip arrays

Published:2013-01 Issue:1 Volume:8 Page:27-31
ISSN:1750-0443
Container-title:Micro & Nano Letters
language:en
Short-container-title:Micro & Nano Letters

Author:

Cho Si‐Hyeong¹,Lee Jung‐Hwan¹,Park Jin‐Goo¹²

Affiliation:

1. Department of Bionano TechnologyHanyang UniversityAnsan426‐791Republic of Korea

2. Department of Materials EngineeringHanyang UniversityAnsan426‐791Republic of Korea

Funder

Ministry of Education, Science and Technology

Publisher

Institution of Engineering and Technology (IET)

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,Bioengineering

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1049/mnl.2012.0834

Reference31 articles.

1. Developments of Plasma Etching Technology for Fabricating Semiconductor Devices

2. Fabrication of vertically aligned Si nanowires on Si (100) substrates utilizing metal‐assisted etching;Hong J.;J. Vac. Sci. Technol. A,2010

3. From Si nanotubes to nanowire: synthesis, characterization, and self‐assembly;Qui T.;J. Cryst. Growth,2005

4. Single-Crystal, Si Nanotubes, and Their Mechanical Resonant Properties

5. Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Controllable Fabrication of Silicon Nanopore Arrays by Two-Step Inductively Coupled Plasma Etching Using Self-Assembled Anodic Aluminum Oxide Mask;ECS Journal of Solid State Science and Technology;2023-06-01

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