Numerical simulation of local charging during plasma etching of a dielectric material
Author:
Publisher
Institution of Engineering and Technology (IET)
Subject
Electrical and Electronic Engineering
Link
https://digital-library.theiet.org/content/journals/10.1049/el_19960585?crawler=true&mimetype=application/pdf
Reference9 articles.
1. Charging of pattern features during plasma etching
2. Effect of Potential Field on Ion Deflection and Shape Evolution of Trenches during Plasma‐Assisted Etching
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1. Specialized design for three basic mask patterns counteract charging effects during plasma etching;Physics of Plasmas;2024-02-01
2. EFFECTS OF EDGE ROUGHNESS ON SURFACE CHARGING IN PLASMA ETCHING;Surface Review and Letters;2023-08-26
3. Charging Issues on the Rectangle Mask Line During Plasma Etching with Consideration of Electron-Solid Interaction;Brazilian Journal of Physics;2023-07-11
4. Distortion Control when Etching DRAM Metal Contact;2023 China Semiconductor Technology International Conference (CSTIC);2023-06-26
5. The Influence of Secondary Electron Emission on Surface Charging on a Mask Trench in Plasma Etching;Moscow University Physics Bulletin;2022-12
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