Deposition of nitrogen doped tetrahedral amorphous carbon (ta-C:N) films by ion beam assisted filtered cathodic vacuum arc
Author:
Publisher
Institution of Engineering and Technology (IET)
Subject
Electrical and Electronic Engineering
Link
https://digital-library.theiet.org/content/journals/10.1049/el_19970901?crawler=true&mimetype=application/pdf
Reference7 articles.
1. Veerasamy, V.S.,: ‘Tetrahedral amorphous carbon deposition, characterisation and electronic properties’, 1994, Ph.D, University of Cambridge Engineering Dept.
2. States in the gap
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