1. Bergman, C., Ion flux characteristics in arc vapor deposition of TiN, Surf. Coat. Technol.36, 243–255, (1988).
2. Vetter, J., Burgmer, W., and Perry, A.J., Arc-enhanced glow discharge in vacuum arc machines, Surf. Coat. Technol.59, 152–155, (1993).
3. Martin, P.J., Netterfield, R.P., Kinder, T.J., and Descotes, L., Deposition of TiN, TiC, and TiO2 films by filtered arc evaporation, Surf. Coat. Technol.49, 239–243, (1991).
4. Ryabchikov, A.I., Stepanov, I.B., Shulepov, I.A., Sharkeyev, Y.P., and Fortuna, S.V., “Application of a shutter-type filter for removing microparticle fraction from arc discharge plasma in technology of TiN coating formation,” 5th Conf. on Modification of Materials with Particle Beams and Plasma Flows, Tomsk, Russia, 319–322, (2000).
5. Tang, B., Wang, Y., Wang, L., Wang, X., Liu, H., Yu, Y., and Sun, T., Adhesion strength of TiN films synthesized on GCr15-bearing steel using plasma immersion ion implantation and deposition, Surf. Coat. Technol.186, 153–156, (2004).