Effect of sputtering pressure on the structure and properties of SiO 2 films prepared by magnetron sputtering-Reference-Cited by-同舟云学术

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Effect of sputtering pressure on the structure and properties of SiO 2 films prepared by magnetron sputtering

Published:2020-10 Issue:12 Volume:15 Page:872-876
ISSN:1750-0443
Container-title:Micro & Nano Letters
language:en
Short-container-title:Micro & Nano Letters

Author:

Zhao Leran¹²,Zhao Changjiang¹²,Liu Juncheng¹²,Liu Zhigang³,Chen Yan³

Affiliation:

1. School of Materials Science and EngineeringTiangong UniversityTianjin300387People's Republic of China

2. State Key Laboratory of Membrane Separation and Membrane ProcessTianjin300387People's Republic of China

3. Institute of Spacecraft System EngineeringBeijing100086People's Republic of China

Funder

National Natural Science Foundation of China

Publisher

Institution of Engineering and Technology (IET)

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,Bioengineering

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1049/mnl.2020.0222

Reference27 articles.

1. Enhanced Light Trapping in Thin Film Solar Cells Using a Plasmonic Fishnet Structure

2. Optical and interfacial layer properties of SiO2 films deposited on different substrates

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1. Borosilicate-Based Framework: Synthesis, Single-Crystal Structure Study, and Physical Properties;Inorganic Chemistry;2024-01-23

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