Statistical Interconnect Crosstalk Noise Model and Analysis for Process Variations-Reference-Cited by-同舟云学术

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Statistical Interconnect Crosstalk Noise Model and Analysis for Process Variations

Published:2015-01 Issue:1 Volume:24 Page:83-87
ISSN:1022-4653
Container-title:Chinese Journal of Electronics
language:en
Short-container-title:Chin. j. electron.

Author:

Li Jianwei¹²,Dong Gang³,Wang Zeng⁴

Affiliation:

1. Faculty of Automation and Information EngineeringXi'an University of TechnologyXi'an710048China

2. State Key Laboratory of Computer ArchitectureInstitute of Computing TechnologyChinese Academy of SciencesBeijing100190China

3. Microelectronics InstituteXidian UniversityXi'an710071China

4. College of Physics SicenceQingdao UniversityQingdao266071China

Funder

National Natural Science Foundation of China

Publisher

Institution of Engineering and Technology (IET)

Subject

Applied Mathematics,Electrical and Electronic Engineering

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1049/cje.2015.01.014

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A temperature-insensitive process corner detection circuit based on self-timing ring oscillator;Microelectronics Reliability;2022-11

2. Low Overhead and Fast Reaction Adaptive Clocking System for Voltage Droop Tolerance;Chinese Journal of Electronics;2019-05

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