Enhancement mode AlGaN/GaN HFET with selectively grown pn junction gate

Author:

Hu X.,Simin G.,Yang J.,Asif Khan M.,Gaska R.,Shur M.S.

Publisher

Institution of Engineering and Technology (IET)

Subject

Electrical and Electronic Engineering

Cited by 152 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Enhancement-Mode AlInN/GaN High-Electron-Mobility Transistors Enabled by Thermally Oxidized Gates;IEEE Transactions on Electron Devices;2024-02

2. Monolithic inverter using GaN-based CMOS-HEMTs with depletion-mode and enhancement-mode of ferroelectric charge trap gate stacked oxide layers;Materials Science in Semiconductor Processing;2024-01

3. Review on Main Gate Characteristics of P-Type GaN Gate High-Electron-Mobility Transistors;Micromachines;2023-12-30

4. Gate Characteristics of Enhancement-Mode Fully Depleted p-GaN Gate HEMT;IEEE Electron Device Letters;2023-12

5. Simulation Study of p-GaN Gate HEMTs With Dielectric Interlayer;2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS);2023-11-27

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