Hard and Tough Sub-Stoichiometric B1 Ta-Mo-Nx Films by Regulating N Content

Author:

Li Hang,Li Jianliang,Kong Jian,Huang Jiewen,Wu Qiujie,Xiong Dangsheng

Publisher

Elsevier BV

Subject

General Earth and Planetary Sciences,General Environmental Science

Reference60 articles.

1. Electronic mechanism for toughness enhancement in Ti x M 1-x N (M= Mo and W);D G Sangiovanni;Physical Review B,2010

2. Supertoughening in B1 transition metal nitride alloys by increased valence electron concentration;D G Sangiovanni;Acta Materialia,2011

3. Effect of WN content on toughness enhancement in V 1-x W x N/MgO (001) thin films;H Kindlund;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,2014

4. (0001) thin films;Mo;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,2018

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