Electrical Performance and Reliability Analysis of Vertical Gan Schottky Barrier Diodes with Dual-Ion Implanted Edge Termination

Author:

Li Bo,Yang Huakai,Gao Linfei,Ma Zhengweng,Lin Jinpei,Wu Zhihao,Chiu Hsien-Chin,Kuo Hao-Chung,Zhang Chunfu,Liu Zhihong,Huang Shuangwu,He Wei,Liu Xinke

Publisher

Elsevier BV

Reference45 articles.

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3. Current status and scope of gallium nitride-based vertical transistors for high-power electronics application;S Chowdhury;Semicond. Sci. Tech,2013

4. Vertical GaN Schottky barrier diodes on Ge-doped free-standing GaN substrates;H Gu;J. Alloy. Compd,2019

5. Carbon and silicon background impurity control in undoped GaN layers grown with trimethylgallium and triethylgallium via metalorganic chemical vapor deposition;M Bakhtiary-Noodeh;J. Cryst. Growth,2023

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