1. Abe, Y., Fujimori, K. and Ike, M.; “Equipment of Photoresist Stripping” (in Japanese), Japanese Patent Disclosure 2008-311256 (2008a)
2. Abe, Y., Fujimori, K. and Ike, M.; “Method of Photoresist Stripping” (in Japanese), Japanese Patent Disclosure 2008-311257 (2008b)
3. The pH dependence of the ozone absorption kinetics in aqueous phenol solutions
4. Bailey, P. S.; Ozonation in Organic Chemistry, Academic Press, New York, USA (1978)