The effect of SF6addition in a Cl2/Ar inductively coupled plasma for deep titanium etching
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials
Link
http://iopscience.iop.org/article/10.1088/1361-6439/aaafe7/pdf
Reference30 articles.
1. Titanium in Medicine
2. Characteristics of the surface oxides on turned and electrochemically oxidized pure titanium implants up to dielectric breakdown:
3. Silicon cryo-etching of deep holes
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