Fabrication of v-groove gratings in InP by inductively coupled plasma etching with SiCl4/Ar
Author:
Publisher
IOP Publishing
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. Reactive ion etching of GaAs and InP using SiCl4
2. Fabrication of Two-Dimensional InP Photonic Band-Gap Crystals by Reactive Ion Etching with Inductively Coupled Plasma
3. Anisotropic etching of InP with low sidewall and surface induced damage in inductively coupled plasma etching using SiCl4
4. High-density plasma etching of compound semiconductors
5. Low Bias Voltage Dry Etching of InP by Inductively Coupled Plasma Using SiCl4/Ar
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