Modeling of InP Etching Under ICP Cl2 /Ar/N2 Plasma Mixture: Effect of N2 on the Etch Anisotropy Evolution
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201200083/fullpdf
Reference35 articles.
1. Fabrication of low loss two-dimensional InP photonic crystals by inductively coupled plasma etching
2. InGaAsP-InP nanoscale waveguide-coupled microring lasers with submilliampere threshold current using Cl/sub 2/--N/sub 2/-based high-density plasma etching
3. Fabrication of submicron-sized features in InP/InGaAsP/AlGaInAs quantum well heterostructures by optimized inductively coupled plasma etching with Cl2/Ar/N2 chemistry
4. Smooth sidewall in InP-based photonic crystal membrane etched by N[sub 2]-based inductively coupled plasma
5. Fabrication of Submicrometer InP Pillars by Colloidal Lithography and Dry Etching
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1. Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production;Physics of Plasmas;2024-07-01
2. Etching of iron and iron–chromium alloys using ICP-RIE chlorine plasma;Plasma Sources Science and Technology;2021-09-01
3. AlN Etching under ICP Cl2/BCl3/Ar Plasma Mixture: Experimental Characterization and Plasma Kinetic Model;MRS Advances;2019-01-31
4. Kinetics and mechanisms for ion-assisted etching of InP thin films in HBr + Cl2 + Ar inductively coupled plasma with various HBr/Cl2 mixing ratios;Thin Solid Films;2018-08
5. Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties;Journal of Vacuum Science & Technology A;2018-05
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