Microwave irradiation impact on Ta2O5stack capacitors with different gates-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Microwave irradiation impact on Ta2O5stack capacitors with different gates

Published:2008-01-31 Issue:3 Volume:23 Page:035004
ISSN:0268-1242
Container-title:Semiconductor Science and Technology
language:
Short-container-title:Semicond. Sci. Technol.

Author:

Atanassova E,Mitin V F,Konakova R V,Spassov D,Schinkarenko V V

Publisher

IOP Publishing

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference30 articles.

1. High-κ gate dielectrics: Current status and materials properties considerations

2. THIN Ta2O5 LAYERS ON Si AS AN ALTERNATIVE TO SiO2 FOR HIGH-DENSITY DRAM APPLICATIONS

3. Materials Characterization of Alternative Gate Dielectrics

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The effects of rapid thermal annealing and microwave annealing on the electrical properties of ZrO2 metal-insulator-metal capacitors;Optik;2019-02

2. Nanomechanical properties of pure and doped Ta2O5and the effect of microwave irradiation;Journal of Physics D: Applied Physics;2012-11-01

3. Conducting and topographic AFM analysis of Hf-doped and Al-doped Ta2O5 films;Thin Solid Films;2011-09

4. Trap parameters and conduction mechanism in HfO2–Ta2O5 mixed stacks in response to microwave irradiation;Microelectronic Engineering;2010-11

5. High-kHfTaO stacks in response to microwave irradiation;Journal of Physics: Conference Series;2010-11-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3