In situUHVEM study of {113}-defect formation in Si nanowires-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

In situUHVEM study of {113}-defect formation in Si nanowires

Published:2015-10-15 Issue:11 Volume:30 Page:114013
ISSN:0268-1242
Container-title:Semiconductor Science and Technology
language:
Short-container-title:Semicond. Sci. Technol.

Author:

Vanhellemont Jan,Anada Satoshi,Yasuda Hidehiro,Marcke Patricia Van,Bender Hugo,Rooyackers Rita,Vandooren Anne

Publisher

IOP Publishing

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0268-1242/30/i=11/a=114013/pdf

Reference26 articles.

1. Impact of process and geometrical parameters on the electrical characteristics of vertical nanowire silicon n-TFETs

2. Diameter-dependent boron diffusion in silicon nanowire-based transistors

3. Quantitative three-dimensional carrier mapping in nanowire-based transistors using scanning spreading resistance microscopy

4. Rod-like defects in silicon: Coesite or hexagonal silicon?

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP