Surface Formation of Single Silicon Wafer Polished with Nano-sized Al2O3Powders
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry
Link
http://cps.scitation.org/doi/pdf/10.1088/1674-0068/20/06/643-648
Reference33 articles.
1. Impact of Chemomechanical Polishing on the Chemical Composition and Morphology of the Silicon Surface
2. The 300 mm silicon wafer — a cost and technology challenge
3. Investigation on the final polishing slurry and technique of silicon substrate in ULSI
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4. Effect of phase transitions on thermoluminescence characteristics of nanocrystalline alumina;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2013-09
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