Using Taguchi Method to Optimize Polishing Parameters in Ice Fixed Abrasive Polishing
Author:
Publisher
Informa UK Limited
Subject
Industrial and Manufacturing Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
http://www.tandfonline.com/doi/pdf/10.1080/10426914.2013.792419
Reference17 articles.
1. Experimental Study on Cryogenic Polishing Single Silicon Wafer with Nano-Sized Cerium Dioxide Powders
2. Impact of Chemomechanical Polishing on the Chemical Composition and Morphology of the Silicon Surface
3. Ultrafine Finishing of Metallic Surfaces with the Ice Bonded Abrasive Polishing Process
4. Polishing Characteristics of Hydrophilic Pad in Chemical Mechanical Polishing Process
5. Chemical Mechanical Planarization from Macro-Scale to Molecular-Scale
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