X-ray lithography for micro- and nano-fabrication at ELETTRA for interdisciplinary applications-Reference-Cited by-同舟云学术

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X-ray lithography for micro- and nano-fabrication at ELETTRA for interdisciplinary applications

Published:2004-08-07 Issue:33 Volume:16 Page:S3517-S3535
ISSN:0953-8984
Container-title:Journal of Physics: Condensed Matter
language:
Short-container-title:J. Phys.: Condens. Matter

Author:

Fabrizio E Di,Fillipo R,Cabrini S,Kumar R,Perennes F,Altissimo M,Businaro L,Cojac D,Vaccari L,Prasciolu M,Candeloro P

Publisher

IOP Publishing

Subject

Condensed Matter Physics,General Materials Science

Link

http://stacks.iop.org/0953-8984/16/i=33/a=013/pdf

Reference52 articles.

1. Design of a beamline for soft and deep lithography on third generation synchrotron radiation source

2. LILIT beamline for soft and deep X-ray lithography at Elettra

3. Deep X-ray lithography beamline at ELETTRA

4. Fabrication of Diffractive Optical Elements On-Fiber for Photonic Applications by Nanolitography

5. Efficient fiber-to-waveguide coupling by a lens on the end of the optical fiber fabricated by focused ion beam milling

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