The effect of redeposition on the ion flux dependence of Si dot pattern formation during ion sputter erosion
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,General Materials Science
Link
http://stacks.iop.org/0953-8984/18/i=13/a=004/pdf
Reference20 articles.
1. Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering
2. Roughness Evolution of Ion Sputtered Rotating InP Surfaces: Pattern Formation and Scaling Laws
3. Production of ordered silicon nanocrystals by low-energy ion sputtering
4. Temperature dependent morphological evolution of Pt(111) by ion erosion: destabilization, phase coexistence and coarsening
5. Energy dependence of quantum dot formation by ion sputtering
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3. Investigation of sputtering target re-deposits by Optical Coherence Tomography and grazing incident X-ray diffraction;Thin Solid Films;2020-02
4. Nanopatterning by ion beam sputtering in unconventional formats;Journal of Physics: Condensed Matter;2018-06-14
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