Fluorine diffusion in silicon under plasma treatment
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,General Materials Science
Reference34 articles.
1. Cluster Model Theoretical Study of the Interaction and Penetration of F on a Si Surface
2. Chemical physics of fluorine plasma‐etched silicon surfaces: Study of surface contaminations
3. Analysis of SF6and F2plasma etched silicon surfaces: An x‐ray photoelectron spectroscopy investigation
4. Adsorption of Gases in Multimolecular Layers
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1. Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy;Journal of Vacuum Science & Technology A;2023-11-13
2. Fluorine–Silicon Surface Reactions during Cryogenic and Near Room Temperature Etching;The Journal of Physical Chemistry C;2014-12-10
3. Fluorine Penetration into Amorphous SiO2Glass at SF6Atmosphere Using Q-Switched Nd:YAG and Excimer Laser Irradiations;Japanese Journal of Applied Physics;2010-07-20
4. Low temperature remote plasma cleaning of the fluorocarbon and polymerized residues formed during contact hole dry etching;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2002
5. Roughness scaling of plasma-etched silicon surfaces;Journal of Physics: Condensed Matter;1998-01-12
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