High throughput electron beam lithography on insulating substrates for photonic devices
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials
Reference11 articles.
1. High-resolution pattern generation using the epoxy novolak SU-8 2000 resist by electron beam lithography
2. High resolution 100kV electron beam lithography in SU-8
3. High resolution electron beam lithography studies on Shipley chemically amplified DUV resists
4. Fabrication of phase masks, for fiber grating printing, using EBL and CHF3 RIE
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1. Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography;Nanotechnology;2016-11-04
2. Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating;Journal of Micromechanics and Microengineering;2014-08-06
3. Epitaxial patterning of thin-films: conventional lithographies and beyond;Journal of Micromechanics and Microengineering;2014-07-31
4. Fabrication of a seamless roller mold with wavy microstructures using mask-less curved surface beam pen lithography;Journal of Micromechanics and Microengineering;2014-03-25
5. Recent Advances in Superhydrophobic Nanomaterials and Nanoscale Systems;Journal of Nanoscience and Nanotechnology;2014-02-01
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