High-resolution pattern generation using the epoxy novolak SU-8 2000 resist by electron beam lithography-Reference-Cited by-同舟云学术

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High-resolution pattern generation using the epoxy novolak SU-8 2000 resist by electron beam lithography

Published:2003 Issue:4 Volume:21 Page:L5
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Aktary Mirwais,Jensen Martin O.,Westra Kenneth L.,Brett Michael J.,Freeman Mark R.

Publisher

American Vacuum Society

Subject

General Engineering

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