Deep wet etching of borosilicate glass using an anodically bonded silicon substrate as mask-Reference-Cited by-同舟云学术

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Deep wet etching of borosilicate glass using an anodically bonded silicon substrate as mask

Published:1998-06-01 Issue:2 Volume:8 Page:84-87
ISSN:0960-1317
Container-title:Journal of Micromechanics and Microengineering
language:
Short-container-title:J. Micromech. Microeng.

Author:

Corman Thierry,Enoksson Peter,Stemme Göran

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Reference8 articles.

Cited by 85 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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