100 nm wide copper lines made by selective electroless deposition
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials
Reference15 articles.
1. Selective electroless copper for VLSI interconnection
2. Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate
3. Laser induced deposition of copper from (triethylphosphine)cyclopentadienylcopper(I)
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